Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

Kimberly Ortega is redefining fashion with scraps, straw and soul. From Quito to New York, her designs stitch together heritage, sustainability and resilience - all under her brand, SOAK. Growing up ...