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Surprising biomedical application found for ASML’s chipmaking EUV lithography machines — they can mass produce nanopores for molecular sensing
IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ultraviolet (EUV) machines.
Following a tumultuous 2025, the stock has increased by nearly 16% during the first week of January, driven by numerous ...
Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...
A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...
Seoul, September 3, 2025 – SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme ultraviolet lithography (NA EUV) lithography system ...
According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...
EUV lithography tools etch the intricate circuit patterns that define chip density and performance. The High NA EUV variant—offering a numerical aperture of 0.55 compared with 0.33 in conventional EUV ...
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They had a semiconductor Manhattan Project”. The prototype was completed in early ...
TL;DR: Intel is expanding its High-NA EUV lithography tool fleet from ASML, ordering two additional machines to advance its next-gen 14A process node. This strategic investment aims to boost Intel's ...
What just happened? SK hynix and ASML have installed the world's first Twinscan NXE:5200B High-NA EUV lithography system at SK hynix's M16 fabrication plant in Icheon, South Korea. The new equipment ...
A new technical paper titled “Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography” was published by researchers at University of ...
TL;DR: TSMC will not use High-NA EUV lithography for its next-gen A14 (1.4nm) process in 2028, opting for conventional 0.33-NA EUV machines to maintain cost efficiency and complexity. This decision ...
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